Major equipment


Scanning Electron Microscopes
FEI NOVA NanoSEM 230 (Risk Assessment / Safe Work Procedure)
Hitachi S2700 LaB6*
Hitachi S3500N VP SEM*
JEOL JSM 5600 SEM*
Philips XL30 FEG SEM (Risk Assessment / Safe Work Procedure)
Philips XL30 FEG ESEM*

Scanning Probe Microscopes*
Atomic Force Microscope System, Explorer TMX 2100
Environmental Scanning Probe Microscope System, JEOL JSPM 5200
Scanning Probe Microscope System, Digital Instruments DI300 SPM

Semiconductor Device Probe Stations*
Probe Station, Micromanipulator 6150-USMC-V2-1-0
Semiautomatic Probe Station, Cascade Summit S12751
Wentworth PROBE STATION MODEL 0-023-0008

Semiconductor Device Analysers*
Semiconductor Parameter Analyzer, HP4156A
Semiconductor Parameter Analyzer, Agilent 4156C
Simultaneous C-V System, Keithley

Optical Instruments*
Optical Microscopes

Sample Preparation Equipment
Sputter Coater (Risk Assessment / Safe Work Procedure)
Tube furnaces, 3-zone, 3"*
Edwards Auto 306 Thermal Evaporator ( (Risk Assessment / Safe Work Procedure)
Wire Bonder*


* These equipment are for internal usage only